4.3 Nanoscale Samples and Integrated Optics
Project coordinators: A. Mermillod-Blondin , D. EngelTopic 5: Magnetron Sputtering source development
In Germany, there are currently only a few manufacturers of magnetron sputter sources that can use a target size of 1” or 2”. Sharp rises in raw material prices are leading to increased demand for these compact sputter sources, particularly among research institutes and university groups, for cost reasons. We have been designing and building sputter sources for our in-house sputter cluster for some time and, as part of the ERDF project MAGIE, we want to spend the next two years examining whether we can optimise our design and bring it to market maturity
- Scaling the design from 2” to 1” and optimization of the water cooling
- New shutter design to ensure flawless shutter movement and regular cleaning of the shutter plate from material debris
- New adapted design of the chimney and the contamination shield
- Development of a new electromagnet based magnetron head