4.3 Nanoscale Samples and Optics
Project coordinators: W. Engel
TOPIC 1:
Optical elements for XUV and soft x-rays
A central task in this project is the development and manufacture of optical elements, such as gratings and holographic masks, using a wide variety of lithography techniques in combination with material processing on a micro- and nanometer scale. To this end, we have in-house UV lithography, reactive ion etching and substrate back thinning at our disposal, supplemented by e-beam lithography and Ga+-FIB at the Zelmi center of the TU Berlin, as well as access to a He+-FIB in collaboration with the FBH.
Gratings and Fresnel zone plates
We develop and fabricate individual optical elements tailored to particular experiments. One example are curved gratings tailored for single-shot fluence mapping at x-ray free electron lasers.
Masks for imaging via x-ray holography
Focused Ion Beam (Ga+-FIB) modification is used to fabricate tailored object and reference apertures in a gold film as a near field mask for Fourier transform x-ray holography.
Modification of various substrate types for imaging and spectroscopy
Our back-thinning method allows preparation of thin film samples grown on bulk substrates. This enable for instance XUV transmission studies of epitaxially grown thin films.